{"slug":"dsd-patents-df-patents-coinventor","domain":"productivity","scope":"global","geo":null,"path":"productivity/global/dsd-patents-df-patents-coinventor","columns":["action","patent_authorities_code","patent_authorities_name","freq","frequency_of_observation","measure_code","measure_name","unit_measure","unit_of_measure","date_type","reference_date_type","ref_area","reference_area","partner_area","counterpart_area","agent_role_code","agent_role_name","cooperation_type_code","cooperation_type_name","wipo","world_intellectual_property_organization_domains","oecd_technology_patent","selected_oecd_technology_domains","year","time_period","value","observation_value","obs_status","observation_status","decimals_code","decimals_name","unit_mult","unit_multiplier"],"rows":[["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","GRC","Greece","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ROU","Romania","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","TTO","Trinidad and Tobago","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","UZB","Uzbekistan","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PAN","Panama","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","DZA","Algeria","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LVA","Latvia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BIH","Bosnia and Herzegovina","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","COL","Colombia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PER","Peru","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","EST","Estonia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BMU","Bermuda","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","UKR","Ukraine","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","KWT","Kuwait","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","THA","Thailand","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ARE","United Arab Emirates","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MLT","Malta","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PHL","Philippines","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ECU","Ecuador","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","KAZ","Kazakhstan","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BLR","Belarus","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","GEO","Georgia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SAU","Saudi Arabia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MNG","Mongolia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LBN","Lebanon","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ARM","Armenia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MAR","Morocco","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CYM","Cayman Islands","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LTU","Lithuania","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SVK","Slovak Republic","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SVN","Slovenia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","URY","Uruguay","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PRI","Puerto Rico","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SYC","Seychelles","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","AND","Andorra","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CRI","Costa Rica","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","IRN","Iran","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PAK","Pakistan","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","DJI","Djibouti","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","NGA","Nigeria","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CYP","Cyprus","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","GTM","Guatemala","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","HRV","Croatia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","JAM","Jamaica","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","JOR","Jordan","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MKD","North Macedonia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","KEN","Kenya","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SLV","El Salvador","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ARG","Argentina","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MDA","Moldova","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CUB","Cuba","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ZWE","Zimbabwe","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LKA","Sri Lanka","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","EU27_2020","European Union (27 countries from 01/02/2020)","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MYS","Malaysia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","POL","Poland","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","IDN","Indonesia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CHL","Chile","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MEX","Mexico","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PRK","Democratic People’s Republic of Korea","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","TUN","Tunisia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SCG_F","Former Serbia and Montenegro","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","MCO","Monaco","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","EGY","Egypt","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BGR","Bulgaria","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ISL","Iceland","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","KOR","Korea","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","PRT","Portugal","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SGP","Singapore","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CZE","Czechia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","RUS","Russia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","TUR","Türkiye","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CHN","China (People’s Republic of)","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","HUN","Hungary","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ESP","Spain","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LUX","Luxembourg","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","VEN","Venezuela","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ZAF","South Africa","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","NZL","New Zealand","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BRA","Brazil","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","LIE","Liechtenstein","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","IND","India","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","IRL","Ireland","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ISR","Israel","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","DNK","Denmark","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","FIN","Finland","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","AUT","Austria","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","ITA","Italy","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","AUS","Australia","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","JPN","Japan","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","NOR","Norway","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","NLD","Netherlands","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CAN","Canada","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","SWE","Sweden","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","CHE","Switzerland","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","BEL","Belgium","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","FRA","France","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","GBR","United Kingdom","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","HKG","Hong Kong (China)","DEU","Germany","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"],["I","US50","United States Patent and Trademark Office","A","Annual","AP","Patent applications","PT_PATN","Percentage of patents","APPLICATION","Application date","LBN","Lebanon","GRC","Greece","_Z","Not applicable","CO","Patents with foreign co-inventor(s)","_Z","Not applicable","_Z","Not applicable",1985,null,0,null,"A","Normal value",1,"One",0,"Units"]],"count":100,"note":"Free sample. Full dataset available at /api/checkout (slug=dsd-patents-df-patents-coinventor)."}